Thick Photolithography for Electroplating by JSR THB-151N Negative Photoresist

HARMST, High Aspect Ratio Micro Structure Technology Workshop 2005, Gyeongju, Korea, 10th – 13th June, 2005, pp. 128-129.

Authors: Y. Kim, I. Llamas, C. Baek, a. Yong-Kweon Kim,

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